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Proceedings Paper

Electron-radiation-sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics
Author(s): Juha T. Rantala; R. Scott Penner; Seppo Honkanen; Nina Nordman; Olli Nordman; Jouko Vaehaekangas; Mahmoud Fallahi; Nasser Peyghambarian
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Paper Abstract

We present two techniques to use hybrid sol-gel materials for electron-beam lithography and direct writing of surface relief diffractive elements. We are able to obtain direct physical electron beam etching of hybrid sol-gel glass and variable- doses can induce complex multi-phase-level diffractive elements and apodized sol-gel waveguide gratings. We are also able to obtain hybrid so-gel glass formation under the electron radiation, so that material can be used as a negative resist in electron-beam lithography. Both of these techniques are promising for the fabrication of submicron optical components and micromachining tools such as embossing masters for the replication.

Paper Details

Date Published: 6 July 1998
PDF: 8 pages
Proc. SPIE 3469, Organic-Inorganic Hybrid Materials for Photonics, (6 July 1998); doi: 10.1117/12.312923
Show Author Affiliations
Juha T. Rantala, Optical Sciences Ctr./Univ. of Arizona (Finland)
R. Scott Penner, Optical Sciences Ctr./Univ. of Arizona (United States)
Seppo Honkanen, Optical Sciences Ctr./Univ. of Arizona (United States)
Nina Nordman, Optical Sciences Ctr./Univ. of Arizona (United States)
Olli Nordman, Optical Sciences Ctr./Univ. of Arizona (United States)
Jouko Vaehaekangas, VTT Electronics (Finland)
Mahmoud Fallahi, Optical Sciences Ctr./Univ. of Arizona (United States)
Nasser Peyghambarian, Optical Sciences Ctr./Univ. of Arizona (United States)


Published in SPIE Proceedings Vol. 3469:
Organic-Inorganic Hybrid Materials for Photonics
Liliane G. Hubert-Pfalzgraf; S. Iraj Najafi, Editor(s)

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