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Proceedings Paper

Photolithography fabrication of sol-gel ridge waveguides
Author(s): Rahmani Sara; Tahar Touam; Chantal Blanchetiere; Z. Saddiki; Kalaichelvi Saravanamuttu; Xin M. Du; Jacek Chrostowski; Mark P. Andrews; S. Iraj Najafi
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Paper Abstract

We report on fabrication of ridge waveguides in UV-light sensitive glass sol-gel thin films, deposited on silicon substrate, using a simple photolithography process. The single-layer films are prepared at low temperature and deep UV-light (DUV) is employed to make the waveguides. The effect of fabrication parameters on waveguide shape is investigated.

Paper Details

Date Published: 6 July 1998
PDF: 6 pages
Proc. SPIE 3469, Organic-Inorganic Hybrid Materials for Photonics, (6 July 1998); doi: 10.1117/12.312911
Show Author Affiliations
Rahmani Sara, Ecole Polytechnique de Montreal (Canada)
Tahar Touam, Ecole Polytechnique de Montreal (Canada)
Chantal Blanchetiere, National Research Council Canada (Canada)
Z. Saddiki, National Research Council Canada (Canada)
Kalaichelvi Saravanamuttu, McGill Univ. (Canada)
Xin M. Du, Ecole Polytechnique de Montreal (Canada)
Jacek Chrostowski, National Research Council Canada (Canada)
Mark P. Andrews, McGill Univ. (Canada)
S. Iraj Najafi, Ecole Polytechnique de Montreal (Canada)


Published in SPIE Proceedings Vol. 3469:
Organic-Inorganic Hybrid Materials for Photonics
Liliane G. Hubert-Pfalzgraf; S. Iraj Najafi, Editor(s)

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