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Proceedings Paper

X-ray micromachining with a laser-plasma source at 1-nm wavelength
Author(s): I. C. Edmond Turcu; Chris M. Mann; Sung W. Moon; B. J. Maddison; Ric M. Allott; Nicola Lisi; Syed Ejazu Huq; Nam Seong Kim
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Paper Abstract

A picosecond excimer laser-plasma source has been constructed which generates an x-ray average power of 2.2 Watt and 1.4 Watt at the wavelengths required for proximity x-ray lithography: 1.4 nm (steel target) and 1 nm (copper target), respectively. The plasma source could be scaled to the 50 - 75 W x-ray average power required for industrial lithographic production by scaling the total average power of the commercial excimer laser system up to 1 kW. The 1 nm x-ray source is used to micromachine a 2.5 THz microwave waveguide-cavity package with a 48 micrometers deep, 3D structure, using the LIGA technique.

Paper Details

Date Published: 2 July 1998
PDF: 12 pages
Proc. SPIE 3405, ROMOPTO '97: Fifth Conference on Optics, (2 July 1998); doi: 10.1117/12.312747
Show Author Affiliations
I. C. Edmond Turcu, Rutherford Appleton Lab. (United States)
Chris M. Mann, Rutherford Appleton Lab. (United Kingdom)
Sung W. Moon, Rutherford Appleton Lab. (UK) and Korea Institute of Science and Technology (South Korea)
B. J. Maddison, Rutherford Appleton Lab. (United Kingdom)
Ric M. Allott, Rutherford Appleton Lab. (United Kingdom)
Nicola Lisi, Rutherford Appleton Lab. (United Kingdom)
Syed Ejazu Huq, Rutherford Appleton Lab. (United Kingdom)
Nam Seong Kim, Rutherford Appleton Lab. (UK) and Kumho Information and Telecommunication Lab. (United States)


Published in SPIE Proceedings Vol. 3405:
ROMOPTO '97: Fifth Conference on Optics
Valentin I. Vlad; Dan C. Dumitras, Editor(s)

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