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Proceedings Paper

Deposition of CN thin films by reactive pulsed laser ablation
Author(s): Alessio Perrone
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Paper Abstract

The effects of laser fluence on the structure and properties of the reactive pulsed laser deposited carbon nitride (CNx) thin films prepared at different gas pressures of N2 and NH3 were investigated. The structure, the morphology and the chemical composition of the films were characterized by X-ray photoelectron spectroscopy, X-ray diffraction, transmission electron microscopy, scanning electron microscopy, Rutherford backscattering and Fourier transform infrared. The films were plane, adhesive and relatively hard, with a low droplet density. The deposition rate decreases with increasing gas pressure and laser fluence, while the N/C atomic ratio increases. The nitrogen concentration in the deposited films drops when the substrate temperature is increased, indicating a desorption process of the CN radicals. Spectroscopic studies of the plasma plume indicates an interesting correlation between the CN band emission intensity and the nitrogen concentration in the samples.

Paper Details

Date Published: 2 July 1998
PDF: 13 pages
Proc. SPIE 3405, ROMOPTO '97: Fifth Conference on Optics, (2 July 1998); doi: 10.1117/12.312744
Show Author Affiliations
Alessio Perrone, Univ. di Lecce (Italy)

Published in SPIE Proceedings Vol. 3405:
ROMOPTO '97: Fifth Conference on Optics
Valentin I. Vlad; Dan C. Dumitras, Editor(s)

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