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Proceedings Paper

Optimization of optical parameters for a critical i-line resist system
Author(s): Rosemary Bell
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Paper Abstract

Optimized optical parameters can enhance the performance of resist systems. Expanded process latitudes can be achieved through the manipulation of the optical levers on a variable parameter stepper, extending a resist system's capability over a wider range of applications. In this study, the parameters being examined are numerical aperture, partial coherence and annularity. A 33 experiment of the optical factors was performed to screen for interactions between factors and to establish a resist model which can characterize behavior over the design space. Responses include energy to clear (Eo), sizing energy (Es), sizing ratio (Es/Eo), Iso/Dense bias, masking linearity, resolution, exposure latitude, focus latitude, and feature profile. Equations are presented to predict resist performance of selected responses for dense lines/spaces, isolated lines, trenches and contact holes. Optical parameter combinations are cited to optimize performance of individual features.

Paper Details

Date Published: 29 June 1998
PDF: 11 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312476
Show Author Affiliations
Rosemary Bell, Shipley Co. Inc. (United States)


Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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