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Proceedings Paper

New approach to 193-nm photoresists: polyspironorbornane polymers
Author(s): Robert P. Meagley; Linus Y. Park; Jean M. J. Frechet
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Paper Abstract

We introduce here a novel approach to highly EUV transparent, carbon dense polymers for application as photoresist materials. The backbone of the prototype polymer consists of bicyclic hydrocarbons spiro-fused to cyclohexane moieties decorated with pendant t-butyl esters. This high polymer is formed through the free radical cyclopolymerization of functionalized norbornane derivatives. Imaging experiments conducted at 193 nm demonstrate features below 0.15 microns.

Paper Details

Date Published: 29 June 1998
PDF: 8 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312471
Show Author Affiliations
Robert P. Meagley, Univ. of California/Berkeley (United States)
Linus Y. Park, Univ. of California/Berkeley (United States)
Jean M. J. Frechet, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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