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Proceedings Paper

Photoacid generation in chemically amplified resists: elucidation of structural effects of photoacid generators using new acid-sensitive dyes for monitoring acid generation
Author(s): James F. Cameron; J. Michael Mori; Thomas M. Zydowsky; Doris Kang; Roger F. Sinta; Matthew King; Juan C. Scaiano; Gerd Pohlers; Susan Virdee; Terry Connolly
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Paper Abstract

This paper focuses on all aspects of acid quantification in DUV resists using novel acid sensitive dyes. The design criteria for creating acid sensitive dyes are discussed and several new classes of dyes are described. Upon protonation, these molecules undergo a large bathochromic shift in the absorption maximum. This change in the UV absorption spectrum can readily be used to quantify acid generation spectrophotometrically. The utility of these new acid sensitive dyes will be demonstrated by quantifying the acid generating efficiency of different PAG classes. In this paper, the relationship between resist performance and PAG structure is studied for a series of DUV PAGs in which the structure of both the chromophore and the acid are varied. In addition, the sensitivity of these dyes is sufficiently high that trace amounts of acid lost from chemically amplified resists during exposure may be measured. Preliminary results of acid loss experiments on assorted DUV PAGs will also be presented.

Paper Details

Date Published: 29 June 1998
PDF: 12 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312467
Show Author Affiliations
James F. Cameron, Shipley Co. Inc. (United States)
J. Michael Mori, Shipley Co. Inc. (United States)
Thomas M. Zydowsky, Shipley Co. Inc. (United States)
Doris Kang, Shipley Co. Inc. (United States)
Roger F. Sinta, Shipley Co. Inc. (United States)
Matthew King, Shipley Co. Inc. (United States)
Juan C. Scaiano, Univ. of Ottawa (Canada)
Gerd Pohlers, Univ. of Ottawa (United States)
Susan Virdee, Univ. of Ottawa (Canada)
Terry Connolly, Univ. of Ottawa (Canada)


Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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