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Proceedings Paper

Resin fractionation effect for photoresist performance
Author(s): Tatsuya Yamada; Yutaka Saito; Kunio Itoh
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Paper Abstract

Two different kinds of novolak resins are synthesized, one is a typical meta-cresol and para-cresol formaldehyde novolak resin and the other is a higher performance novolak resin, and which are fractionated into different molecular weight distributions. I-line photoresists with these different molecular weight distribution novolak resins are formulated and I-line photoresist performance is evaluated based on the Mw/Mn. From these consequence, it is found novolak resin has an optimum Mw/Mn value in the improvement of resolution and the improvement with resin fractionation is less than with different kind of novolak resin.

Paper Details

Date Published: 29 June 1998
PDF: 12 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312446
Show Author Affiliations
Tatsuya Yamada, Nagase Electronic Chemicals Ltd. (Japan)
Yutaka Saito, Nagase Electronic Chemicals Ltd. (Japan)
Kunio Itoh, Nagase Electronic Chemicals Ltd. (Japan)


Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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