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Proceedings Paper

Techniques for the analysis of Cl- ion in TMAH
Author(s): Bang-Chein Ho; Mong-Ling Chang; Yu-Ping Lin
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Paper Abstract

Fabricating integrated circuits with increasingly smaller elements mandates that the chlorine ion contents in 2.38% TMAH to be under the 50 ppb level. Previously, the interference from TMAH inhibited the analysis of chlorine ion in TMAH by ion chromatography. In this study, we present a novel technique to eliminate the annoying interference from TMAH. By using of acid type cation exchange resin Amberite IR-120, the interference from TMA+ and OH- is successfully eliminated. The TMA+ cation is retained in the exchange resin and the OH- from TMAH neutralized with the H+ released from the resin. This relatively simple scheme of cation exchange preprocessing not only eliminates the influence of TMAH, but also possesses the additional merit that the Cl- anion has remained intact through the cation exchange resin. To further increase the detection limit, on-line preconcentration by ion chromatography has been coupled with the above scheme by cation exchange resin preprocessing, via this technique, the detection limit of sub 1 ppb level is achieved with no need of adding a standard.

Paper Details

Date Published: 29 June 1998
PDF: 16 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312436
Show Author Affiliations
Bang-Chein Ho, Industrial Technology Research Institute (Taiwan)
Mong-Ling Chang, Industrial Technology Research Institute (Taiwan)
Yu-Ping Lin, Industrial Technology Research Institute (Taiwan)


Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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