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Proceedings Paper

Effects of a visualization dye in a thick film photoresist
Author(s): Kathryn H. Jensen; Stanley A. Ficner
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Paper Abstract

The development of a dyed thick film photoresist for visualization purposes is described. The need for a visualization dye for residual resist (the coil layers) is a possible requirement for the thin film head fabrication technology. Because of the high transparency of the photoresist used in the production of magnetic read/write devices, it may be desirable for a dye to improve visualization properties. A method is described in which a dyed thick film photoresist is developed. Performance requirements are discussed and a lithographic evaluation is given. Assessment of the formulations were carried out on an UltratechTM stepper using a current production photoresist as a standard. It is necessary to maintain resist performance such as photospeed, resolution capabilities, and depth of focus. Advantages and disadvantages are presented for the dyed thick film photoresist. Also included is a discussion concerning the critical factor of dye concentration present within the photoresist.

Paper Details

Date Published: 29 June 1998
PDF: 8 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312431
Show Author Affiliations
Kathryn H. Jensen, Clariant Corp. (United States)
Stanley A. Ficner, Clariant Corp. (United States)


Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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