Share Email Print
cover

Proceedings Paper

Study of bake mechanisms by real-time in-situ ellipsometry
Author(s): Patrick Jean Paniez; Aime Vareille; Patrice Ballet; Benedicte P. Mortini
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Film formation and bake processes have been studied using in-situ ellipsometry. This new experimental set-up based on a HeNe laser mounted over a hot-plate is shown to be mainly sensitive to physical changes in the resist layer and provides real-time monitoring of the modifications induced during bake steps. Pure polymer films as well as DUV 248 nm and 193 nm CA resists are investigated.

Paper Details

Date Published: 29 June 1998
PDF: 12 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312418
Show Author Affiliations
Patrick Jean Paniez, France Telecom/CNET Grenoble (France)
Aime Vareille, France Telecom/CNET Grenoble (France)
Patrice Ballet, France Telecom/CNET Grenoble (France)
Benedicte P. Mortini, SGS-Thomson Microelectronics (France)


Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

© SPIE. Terms of Use
Back to Top