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Proceedings Paper

Study of bake mechanisms by real-time in-situ ellipsometry
Author(s): Patrick Jean Paniez; Aime Vareille; Patrice Ballet; Benedicte P. Mortini
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Paper Abstract

Film formation and bake processes have been studied using in-situ ellipsometry. This new experimental set-up based on a HeNe laser mounted over a hot-plate is shown to be mainly sensitive to physical changes in the resist layer and provides real-time monitoring of the modifications induced during bake steps. Pure polymer films as well as DUV 248 nm and 193 nm CA resists are investigated.

Paper Details

Date Published: 29 June 1998
PDF: 12 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312418
Show Author Affiliations
Patrick Jean Paniez, France Telecom/CNET Grenoble (France)
Aime Vareille, France Telecom/CNET Grenoble (France)
Patrice Ballet, France Telecom/CNET Grenoble (France)
Benedicte P. Mortini, SGS-Thomson Microelectronics (France)

Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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