Share Email Print

Proceedings Paper

Chemical and lithographic aspects of organic deep-UV BARCs
Author(s): Munirathna Padmanaban; Wen-Bing Kang; Ken Kimura; Yoshino Nishiwaki; Georg Pawlowski; Hatsuyuki Tanaka
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Bottom anti-reflective coatings (BARC) are useful to suppress the problems associated with reflection. In addition to matching the basic properties such as strong absorption at the exposure wavelength, and high etch rate, a commercially successful deep UV BARC material should be adaptable to as many chemically amplified resists as possible. A photoresist solvent compatible organic BARC material needs to have a minimum of two functions i.e., a dye to control the reflection, and a hardening agent or cross-linker to avoid intermixing with the resist cast on it. The dye and hardening components can be included to the BARC formulation in the form of additives or as an integral part of the polymer. We have designed novel BARC materials containing the dye and hardening function in the same polymer. Optionally, a third function can be incorporated to optimize the etch and solubility characteristics.

Paper Details

Date Published: 29 June 1998
PDF: 13 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312410
Show Author Affiliations
Munirathna Padmanaban, Clariant Japan K.K. (United States)
Wen-Bing Kang, Clariant Japan K.K. (Japan)
Ken Kimura, Clariant Japan K.K. (Japan)
Yoshino Nishiwaki, Clariant Japan K.K. (Japan)
Georg Pawlowski, Clariant Japan K.K. (United States)
Hatsuyuki Tanaka, Clariant Japan K.K. (Japan)

Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

© SPIE. Terms of Use
Back to Top