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Proceedings Paper

Processing of acrylate-based 193-nm resists: influence of physico-chemical properties
Author(s): Benedicte P. Mortini; Charles Rosilio; Alain Prola; Patrick Jean Paniez
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Paper Abstract

The large variety of protecting groups that can be employed for acrylate based resists increases the number of mechanisms encountered when implementing these new materials. Some of these phenomena, related to both their physical and chemical properties, are investigated.

Paper Details

Date Published: 29 June 1998
PDF: 12 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312406
Show Author Affiliations
Benedicte P. Mortini, SGS-Thomson Microelectronics (France)
Charles Rosilio, CEA-CENS (France)
Alain Prola, France Telecom/CNET (France)
Patrick Jean Paniez, France Telecom/CNET (France)


Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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