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Proceedings Paper

Process effects resulting from conversion to a safe-solvent organic BARC
Author(s): James C. Cox; Lynn Welsh; Deborah Murphy; Ronald J. Eakin; Pierre Silvestre; Ralph R. Dammel; Shuji Ding; Brad Williams; Dinesh N. Khanna
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Paper Abstract

The use of bottom antireflective coatings (BARCs) as a means for controlling substrate reflectivity and thin film effects, has become commonplace in today's wafer fabs. In an effort to simplify process integration, reduce environmental impact, and reduce processing costs, some next generation organic BARC materials have recently been introduced which are formulated with photoresist compatible solvent systems. This study examines the process effects of converting from the cyclohexanone based AZTM BARLiTM anti-reflective coating, to the recently introduced PGME/Ethyl Lactate based AZTM BARLiTM II anti-reflective coating. We will present a comparison of the optical properties of the two products, and examine i-line lithographic process effects including process latitudes, CD distributions, and coat defects, as well as post etch CD distributions, and dye sublimation during cure.

Paper Details

Date Published: 29 June 1998
PDF: 11 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312394
Show Author Affiliations
James C. Cox, Texas Instruments Inc. (United States)
Lynn Welsh, Texas Instruments Inc. (United States)
Deborah Murphy, Texas Instruments Inc. (United States)
Ronald J. Eakin, Clariant Corp. (United States)
Pierre Silvestre, Clariant Corp. (United States)
Ralph R. Dammel, Clariant Corp. (United States)
Shuji Ding, Clariant Corp. (United States)
Brad Williams, Clariant Corp. (United States)
Dinesh N. Khanna, Clariant Corp. (United States)

Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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