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Proceedings Paper

Dissolution-rate analysis of ArF resist polymers based on the percolation model
Author(s): Atsuko Yamaguchi; Shinji Kishimura; Nobuyuki N. Matsuzawa; Takeshi Ohfuji; Tomoaki Tanaka; Seiichi Tagawa; Masaru Sasago
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Paper Abstract

We investigated the dissolution properties of methacrylate polymers to study the development mechanism of chemically amplified resists. We measured the dissolution rate of methacrylate copolymers as a function of the hydrophilic unit content, and simulated dissolution phenomena based on percolation theory. The dissolution rate curves we obtained had strong nonlinear dependence on hydrophilic unit content. In the simulation analysis, base molecule diffusion through the hydrophilic path was modeled as particle diffusion through the percolation field. The diffusion constant was calculated based on conventional and modified diffusion models. The width of the diffusion path is not considered in a conventional model. We suggested a new variable to describe diffusion path width in the modified model. The simulation results indicated that our model reproduced the experimental results better than the conventional model.

Paper Details

Date Published: 29 June 1998
PDF: 10 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312365
Show Author Affiliations
Atsuko Yamaguchi, Association of Super-Advanced Electronics Technologies (Japan)
Shinji Kishimura, Association of Super-Advanced Electronics Technologies (Japan)
Nobuyuki N. Matsuzawa, Association of Super-Advanced Electronics Technologies (Japan)
Takeshi Ohfuji, Association of Super-Advanced Electronics Technologies (Japan)
Tomoaki Tanaka, Osaka Univ. (Japan)
Seiichi Tagawa, Osaka Univ. (Japan)
Masaru Sasago, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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