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Proceedings Paper

Monitoring photoacid generation in chemically amplified resist systems
Author(s): Uzodinma Okoroanyanwu; Jeff D. Byers; Ti Cao; Stephen E. Webber; C. Grant Willson
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Paper Abstract

A new, simple, highly sensitive, and reliable technique has been developed for measuring acid concentration in solutions and in thin polymer films. This technique is applicable to the study of photoacid generation in chemically amplified resist systems. It employs fluorescent, acid sensitive compounds such as N-(9-acrydinyl)acetamide which undergo large changes in fluorescence as a function of degree of protonation. We have used this technique to quantify the amount of acid generated as a function of 193 nm exposure dose in alicyclic polymer matrices containing photoacid generators such as triphenylsulfonium hexafluoroantimonate. We are continuing to explore the general utility of this new analytical technique which allows the study of diffusional processes and the determination of quantum efficiencies in thin polymer films of the kind used in deep-UV (KrF at 248 nm, ArF at 193 nm) lithography. Such data are of importance in the modeling of chemically amplified resist systems.

Paper Details

Date Published: 29 June 1998
PDF: 11 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312357
Show Author Affiliations
Uzodinma Okoroanyanwu, Univ. of Texas/Austin (United States)
Jeff D. Byers, SEMATECH (United States)
Ti Cao, Univ. of Texas/Austin (United States)
Stephen E. Webber, Univ. of Texas/Austin (United States)
C. Grant Willson, Univ. of Texas/Austin (United States)

Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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