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Proceedings Paper

Lithographic evaluation of a new high-performance photoresist composition
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Paper Abstract

`Non-critical' levels such as implant layer consume a large volume of photoresist. This work was done to choose a cost- effective, high performance implant resist implant resist. IN addition to resolution considerations, outgassing during implant, speed and cost were all evaluated to choose the successful candidate. Through this effort a new resist formulation, SumiresistTM PFM-10 was compared with other existing I-line formulations.

Paper Details

Date Published: 29 June 1998
PDF: 9 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312353
Show Author Affiliations
Warren Montgomery, LSI Logic Corp. (United States)
Neal P. Callan, LSI Logic Corp. (United States)
Alan E. Kozlowski, Shipley Co., Inc. (United States)


Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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