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Proceedings Paper

High-performance profiles and characteristics of chemically amplified resist
Author(s): Hideaki Mochizuki; Hiroshi Tomiyasu; Yasuhiro Kameyama; Michinori Tsukamoto; Takaaki Niinomi; Yuki Tanaka; Jun Fujita; Tameichi Ochiai
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Paper Abstract

We investigated means of the linewidth control of the 0.20 micrometers isolated line of the chemically amplified resist with a conventional exposure method (without specific illumination optics or mask). In order to clarify the influence of the light intensity of the optical image on a wafer, we calculated the optical image by photolithography simulator `Prolith/2'. This result suggests that the CD deviation between isolated lines and dense lines depends on the optical parameters. For the purpose of controlling the CD deviation between isolated and dense lines, we tried to control the acid diffusion length and the dissolution characteristic. In order to control the acid diffusion length, post-exposure baking temperature and an acid diffusion inhibitor worked effectively. On the other hand, an dissolution inhibitor having several functional groups which was able to form hydrogen-bonds with hydroxyl groups of the base polymer contributed to adjustment of dissolution characteristics. Using these results, we developed a resist of which the isolated and dense line were quite well controlled. Further, this resist had a good resolution and a good pattern profile and resolved 0.18 micrometers lines and spaces pattern using KrF excimer laser stepper (Nikon NSR, NA equals 0.55).

Paper Details

Date Published: 29 June 1998
PDF: 7 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312352
Show Author Affiliations
Hideaki Mochizuki, Mitsubishi Chemical Co. (Japan)
Hiroshi Tomiyasu, Mitsubishi Chemical Co. (Japan)
Yasuhiro Kameyama, Mitsubishi Chemical Co. (Japan)
Michinori Tsukamoto, Mitsubishi Chemical Co. (Japan)
Takaaki Niinomi, Mitsubishi Chemical Co. (Japan)
Yuki Tanaka, Mitsubishi Chemical Co. (Japan)
Jun Fujita, Mitsubishi Chemical Co. (Japan)
Tameichi Ochiai, Mitsubishi Chemical Co. (Japan)


Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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