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Proceedings Paper

Novolak resin for ultrafast high-resolution positive i-line photoresist compositions
Author(s): M. Dalil Rahman; Ping-Hung Lu; Michelle M. Cook; Woo-Kyu Kim; Dinesh N. Khanna
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Paper Abstract

An improved process for isolation of novolak resins from phenol-formaldehyde condensation products has been developed. The process results in resins having low polydispersity and higher photospeed while typical phenol/formaldehyde resin syntheses generate a broad distribution of molecular weight fragments with a wide polydispersity. The novolak resins were characterized by NMR and GPC and were formulated to obtain ultra fast high resolution i-line photoresists. The characteristics of the resins and their effect on lithographic properties as i-line photoresist compositions will be discussed in this paper.

Paper Details

Date Published: 29 June 1998
PDF: 12 pages
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312347
Show Author Affiliations
M. Dalil Rahman, Clariant Corp. (United States)
Ping-Hung Lu, Clariant Corp. (United States)
Michelle M. Cook, Clariant Corp. (United States)
Woo-Kyu Kim, Clariant Corp. (United States)
Dinesh N. Khanna, Clariant Corp. (United States)


Published in SPIE Proceedings Vol. 3333:
Advances in Resist Technology and Processing XV
Will Conley, Editor(s)

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