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Proceedings Paper

Present and future trends in excimer-laser-based microlithography
Author(s): Frank K. Tittel; Miklos Erdelyi; Zoltan L. Horvath; Armen Kroyan; William L. Wilson; Michael C. Smayling; Zsolt Bor; Gabor Szabo
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Paper Abstract

Optical microlithography is continuing to play a key role in the fabrication of feature sizes in the 0.25 - 0.1 micrometers regime as the semiconductor industry enters manufacturing of the gigabit chip generation. Several important advances in technologies are needed to achieve this goal. These include the use of excimer lasers and optical resolution enhancement schemes, which will be addressed in this work.

Paper Details

Date Published: 29 June 1998
PDF: 6 pages
Proc. SPIE 3403, International Conference on Atomic and Molecular Pulsed Lasers II, (29 June 1998); doi: 10.1117/12.311947
Show Author Affiliations
Frank K. Tittel, Rice Univ. (United States)
Miklos Erdelyi, Rice Univ. (Hungary)
Zoltan L. Horvath, JATE Univ. (Hungary)
Armen Kroyan, Rice Univ. (United States)
William L. Wilson, Rice Univ. (United States)
Michael C. Smayling, Texas Instruments, Inc. (United States)
Zsolt Bor, JATE Univ. (Hungary)
Gabor Szabo, JATE Univ. (Hungary)


Published in SPIE Proceedings Vol. 3403:
International Conference on Atomic and Molecular Pulsed Lasers II
Victor F. Tarasenko; Georgy V. Mayer; Gueorgii G. Petrash, Editor(s)

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