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Proceedings Paper

Influence of aberration on performance during use of resolution enhancement technology
Author(s): Kouichirou Tsujita; Junjiro Sakai; Akihiro Nakae; Shuji Nakao; Wataru Wakamiya
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Paper Abstract

We have investigated the influence of a spherical aberration on the printing characteristics with modified illumination. At first, we have developed a simple method for measuring the aberration function with an alternating phase shift mask (PSM), and have measured that in the projection optics of a commercially available KrF stepper. Then the anomalous phenomena observed in the printing with modified illumination are examined with the simulated aerial images with the measured spherical aberration. As a result, we found good coincidence between the simulated images and the anomalies. In conclusion, the origin of the anomalies is ascribed to the spherical aberration in the projection optics.

Paper Details

Date Published: 29 June 1998
PDF: 13 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310820
Show Author Affiliations
Kouichirou Tsujita, Mitsubishi Electric Corp. (Japan)
Junjiro Sakai, Mitsubishi Electric Corp. (Japan)
Akihiro Nakae, Mitsubishi Electric Corp. (Japan)
Shuji Nakao, Mitsubishi Electric Corp. (Japan)
Wataru Wakamiya, Mitsubishi Electric Corp. (Japan)


Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

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