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Proceedings Paper

Effect of lens aberrations as a function of illumination condition on full-field process windows
Author(s): Audrey M. Davis; Andrew E. Bair; Bradley D. Lantz; Jeffrey R. Johnson; Charles R. Spinner III
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Paper Abstract

The effect of lens aberrations on the process windows of a 248 nm stepper is presented for multiple locations within the exposure field and for various illumination conditions. It is shown that the effect on the process window depends on the field location and the illumination condition. The common process window for multiple field locations is significantly reduced from the single location result. Process window data obtained with one illumination condition is shown to be useful in predicting results with other illumination conditions.

Paper Details

Date Published: 29 June 1998
PDF: 9 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310818
Show Author Affiliations
Audrey M. Davis, SGS-Thomson Microelectronics (United States)
Andrew E. Bair, SGS-Thomson Microelectronics (United States)
Bradley D. Lantz, SGS-Thomson Microelectronics (United States)
Jeffrey R. Johnson, SGS-Thomson Microelectronics (United States)
Charles R. Spinner III, SGS-Thomson Microelectronics (United States)


Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

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