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Proceedings Paper

Application of substructuring method to three-dimensional optical lithography simulation
Author(s): Seung-Gol Lee; Choong-Ki Seo; Dong-Hoon Lee; Jong-Ung Lee; MeangHyo S. Cho
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Paper Abstract

The three-dimensional optical lithography simulator on the basis of finite element method is newly introduced. Contrary to the conventional direct finite element method, the problem of huge memory requirement can be resolved by applying the substructuring method to finite element method. In our scheme, the global domain, which consists of photoresist, interlayers, and the substrate, is divided into several subdomains. After each subdomain is treated locally, the calculation results are integrated altogether. Since the consuming memory is tremendously reduced by the substructuring method, the three- dimensional case can be successfully simulated at the engineering workstation. We have compared our scheme with the conventional direct finite element, and investigated the reduction of computational memory by the substructuring method.

Paper Details

Date Published: 29 June 1998
PDF: 8 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310812
Show Author Affiliations
Seung-Gol Lee, Inha Univ. (South Korea)
Choong-Ki Seo, Inha Univ. (South Korea)
Dong-Hoon Lee, Inha Univ. (Japan)
Jong-Ung Lee, Chongju Univ. (South Korea)
MeangHyo S. Cho, Inha Univ. (South Korea)

Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

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