Share Email Print

Proceedings Paper

Development of an integrated 3D lithography simulator
Author(s): Choong-Ki Seo; Seung-Gol Lee; Jong-Ung Lee
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We have developed our own three-dimensional optical lithography simulator, LG-OLiS (LG-Optical Lithography Simulator), which can be applied to both the 2-D and the 3-D non-planar cases. It includes with all processes of optical lithography such as the formation of an aerial image, the exposure, the post-exposure bake (PEB), and the development processes. Several kinds of numerical methods are adopted for numerical implementation and the simulation of an aerial image and the exposure process are based on both the approximate theory and the rigorous theory. Therefore, our LG-OLiS can simulate the topological case efficiently nd exactly.

Paper Details

Date Published: 29 June 1998
PDF: 8 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310810
Show Author Affiliations
Choong-Ki Seo, Inha Univ. (South Korea)
Seung-Gol Lee, Inha Univ. (South Korea)
Jong-Ung Lee, Chongju Univ. (South Korea)

Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

© SPIE. Terms of Use
Back to Top