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Proceedings Paper

Use of melting inorganic photoresist for microlens array fabrication
Author(s): Changtai Yu; Fengzhen Guo; Ying Chen; Hua Yu
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Paper Abstract

In this paper, we will show that it is possible to generate very small lenses by melting islands of inorganic photoresist on a glass substrate. The inorganic photoresist composited by us is suitable to be exposed by Electron Beam (EBE) or X-Ray. We have obtained the lithophotography pattern with 0.6 micrometer line width by EBE exposure. Because the resist pattern will not swell and distort in the developing solution, so there is no problem of shelf-life. We have made lenses with diameter ranging from 0.8 mm to 1.0 mm in the form of spheres and also have studied their optical properties.

Paper Details

Date Published: 29 June 1998
PDF: 3 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310804
Show Author Affiliations
Changtai Yu, Zhejiang Univ. (China)
Fengzhen Guo, Zhejiang Univ. (China)
Ying Chen, Zhejiang Univ. (China)
Hua Yu, Cymer Corp. (United States)


Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

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