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Proceedings Paper

New method for improving the practical resolution of complex patterns in sub-half-micron lithography
Author(s): Xunan Chen; Xiangang Luo; HanMin Yao; Qian Xiao; Guobin Yu
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Paper Abstract

A new approach, based on the optimization of illumination light by micro-optical element, is applied to improve the practical resolution of complex pattern in sub-half micron lithography. Several micro optical plates are devised to optimize the illumination light. Through the detailed theoretical expansion of the optics for the new structure, simulation of the aerial image is carried out. And the experiments verify the results of simulation.

Paper Details

Date Published: 29 June 1998
PDF: 12 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310786
Show Author Affiliations
Xunan Chen, Institute of Optics and Electronics (China)
Xiangang Luo, Institute of Optics and Electronics (China)
HanMin Yao, Institute of Optics and Electronics (China)
Qian Xiao, Institute of Optics and Electronics (China)
Guobin Yu, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

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