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Proceedings Paper

Modifications of polymeric ARC films by UV irradiation
Author(s): Ronald A. Carpio; Alan Stephen; Jeffrey A. Eisele
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Paper Abstract

Plasma etch studies as well as optical spectroscopic and contact angle measurements have been performed on a number of blanket spin-on organic antireflective coatings prior to and after being subjected to various UV photostabilization processes. Included in this study are antireflective coatings, which are in current use for 248 nm and 365 nm applications as well as others that are being evaluated for 193 nm lithography. The exposure dose, temperature, and blanketing atmosphere during the curing process were varied. The objective of these studies is to generate fundamental information regarding the impact of different UV photostabilization processes upon the structural, optical, and surface properties as well as upon the etch characteristics of these films.

Paper Details

Date Published: 29 June 1998
PDF: 11 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310742
Show Author Affiliations
Ronald A. Carpio, SEMATECH (United States)
Alan Stephen, SEMATECH and Advanced Micro Devices, Inc. (United States)
Jeffrey A. Eisele, Eaton Corp. (United States)


Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

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