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Proceedings Paper

Reformulation for latent image formation model in photolithography using numerical absorbing boundary condition
Author(s): In-Ho Park; Hye-Keun Oh; S. B. Hyun
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Paper Abstract

A method for simulating latent image formation in a photoresist illuminated by an arbitrary imaging system is presented. The perfectly matched layer absorbing boundary condition is applied to take wave propagation in the infinite region surrounding the photoresist into account. The validity of the method is examined by comparing the results with those made by the vertical propagation model and the previous two- dimensional models.

Paper Details

Date Published: 29 June 1998
PDF: 12 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310741
Show Author Affiliations
In-Ho Park, Univ. of Inchon (South Korea)
Hye-Keun Oh, Hanyang Univ. (South Korea)
S. B. Hyun, Korea Advanced Institute of Science and Technology (South Korea)


Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

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