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Proceedings Paper

Characterizing the absorption and aging behavior of DUV optical material by high-resolution excimer laser calorimetry
Author(s): Klaus R. Mann; Eric Eva
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Paper Abstract

Absorption loss in DUV optics during 193 nm irradiation is investigated by employing a high-resolution calorimetric technique which allows determining both single and two photon absorption coefficients at energy densities of several 10 mJ/cm2, avoiding a significant thermal load on the samples. UV calorimetry is also employed to investigate laser induced aging phenomena, e.g. color center formation in fused silica or CaF2. A separation of transient and cumulative effects as a function of intensity can be achieved, giving insight into various loss mechanisms. Moreover, the influence of dielectric coatings on the absorption characteristics is discussed.

Paper Details

Date Published: 29 June 1998
PDF: 7 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310736
Show Author Affiliations
Klaus R. Mann, Laser Lab. Goettingen e.V. (Germany)
Eric Eva, Laser Lab. Goettingen e.V. (Germany)


Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

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