Share Email Print
cover

Proceedings Paper

Surface finish and optical quality of CaF2 for UV lithography applications
Author(s): Angela Duparre; Roland Thielsch; Norbert Kaiser; Stefan Jakobs; Klaus R. Mann; Eric Eva
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

CaF2 has received increasing attention as a promising substrate for coatings in the VUV range. Optimization of the optical properties of these optical components requires the study of basic characteristics of the coated and uncoated CaF2 substrates such as surface roughness, optical performance, absorption and scatter losses, and laser induced damage threshold. The investigations reveal the influence of different substrate polishing grades on the quality of the coated components.

Paper Details

Date Published: 29 June 1998
PDF: 7 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310735
Show Author Affiliations
Angela Duparre, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Roland Thielsch, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Norbert Kaiser, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Stefan Jakobs, Fraunhofer-Institut fuer Angewandte Optik und Feinmechanik (Germany)
Klaus R. Mann, Laser Lab. Goettingen e.V. (Germany)
Eric Eva, Laser Lab. Goettingen e.V. (Germany)


Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

© SPIE. Terms of Use
Back to Top