Share Email Print

Proceedings Paper

High-spectral-purity and high-durability kHz KrF excimer laser with advanced rf preionization discharge
Author(s): Tatsuo Enami; Osamu Wakabayashi; Toshihiro Nishisaka; Natsushi Suzuki; Takashi Nire; Hakaru Mizoguchi; Hiroaki Nakarai; Hirokazu Tanaka; Tatsuya Ariga; Kouji Shio; Takeshi Okamoto; Ryoichi Nodomi; Hitoshi Tomaru; Kiyoharu Nakao
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We present the performance and durability of the newest model of the KrF excimer laser for microlithography KLES-G10K. The laser achieves 10 W of output power with 0.7 pm bandwidth at 1000 Hz with newly developed solid state pulsed power module and the high precise narrowing module. The durability of laser tube achieves 5 billion pulses with the new radio frequency preionization scheme, which reduces consumption of fluorine gas and maintenance of laser tube drastically.

Paper Details

Date Published: 29 June 1998
PDF: 10 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310733
Show Author Affiliations
Tatsuo Enami, Komatsu Ltd. (Japan)
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Toshihiro Nishisaka, Komatsu Ltd. (Japan)
Natsushi Suzuki, Komatsu Ltd. (Japan)
Takashi Nire, Komatsu Ltd. (Japan)
Hakaru Mizoguchi, Komatsu Ltd. (Japan)
Hiroaki Nakarai, Komatsu Ltd. (Japan)
Hirokazu Tanaka, Komatsu Ltd. (Japan)
Tatsuya Ariga, Komatsu Ltd. (Japan)
Kouji Shio, Komatsu Ltd. (Japan)
Takeshi Okamoto, Komatsu Ltd. (Japan)
Ryoichi Nodomi, Komatsu Ltd. (Japan)
Hitoshi Tomaru, Komatsu Ltd. (Japan)
Kiyoharu Nakao, Komatsu Ltd. (Japan)

Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

© SPIE. Terms of Use
Back to Top