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Proceedings Paper

Feasibility studies of operating KrF lasers at ultranarrow spectral bandwidths for 0.18-um line widths
Author(s): Alexander I. Ershov; Thomas Hofmann; William N. Partlo; Igor V. Fomenkov; George Everage; Palash P. Das; Dave Myers
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Paper Abstract

The use of higher NA lenses and higher throughput of the next generation 248 nm microlithography systems sets tight requirements on the spectral properties of the laser as well as its power output and dose stability. We demonstrate that such scaling of spectral widths, power and repetition rates is possible by revisiting some of the dynamics of evolution of laser spectrum and stability of laser discharge. In the following, we present results of several optical configurations, that result in spectral widths between 1.0 and 2.0 pm (95% integrated linewidth). The optical configurations are derivatives of Cymer's standard Littrow grating and prism expander configuration. Thereby, the other parameters (beam size, coherence, etc.) are not impacted. Simultaneously, we provide results of scaling a laser to 2 kHz with a dose stability of less than plus or minus 0.5% over a 16 ms window. The resulting laser is now capable of meeting the technical requirements of the next generation microlithography scanners.

Paper Details

Date Published: 29 June 1998
PDF: 10 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310732
Show Author Affiliations
Alexander I. Ershov, Cymer, Inc. (United States)
Thomas Hofmann, Cymer, Inc. (United States)
William N. Partlo, Cymer, Inc. (United States)
Igor V. Fomenkov, Cymer, Inc. (United States)
George Everage, Cymer, Inc. (United States)
Palash P. Das, Cymer, Inc. (United States)
Dave Myers, Cymer, Inc. (United States)


Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

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