Share Email Print
cover

Proceedings Paper

Alignment system for ArF excimer-laser-based step-and-scan system
Author(s): Dohoon Kim; Jong-Soo Kim; Yeung Joon Sohn; Jin Hyuk Kwon; Kag Hyeon Lee; Sang-Soo Choi; Hai Bin Chung; Hyung Joun Yoo; Bo Woo Kim
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

ArF excimer laser exposure tool is expected as a workhorse in gigabit DRAM mass production era. It can resolve 0.18 micrometer or finer patterns due to its short wavelength of illumination light. Also, the step-and-repeat photolithography system is changing to more complicated step-and-scan system. On the other hand, this in turn requires alignment system to work to tighter budgets. In the 0.18 micrometer optical lithography performance level, overlay error should be maximum 40 nm. In this paper, we report the theory and design parameters of the alignment system for home made ArF excimer laser based step & scan system. We have examined the advantages of our alignment system, and have implemented a trade-off strategy. Our discussion includes an overview of the alignment system which composed of reticle alignment system, wafer alignment system (off-axis and TTL) and auto focus/leveling system.

Paper Details

Date Published: 29 June 1998
PDF: 13 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310725
Show Author Affiliations
Dohoon Kim, Electronics and Telecommunications Research Institute (South Korea)
Jong-Soo Kim, Electronics and Telecommunications Research Institute (South Korea)
Yeung Joon Sohn, Electronics and Telecommunications Research Institute (South Korea)
Jin Hyuk Kwon, Yeungnam Univ. (South Korea)
Kag Hyeon Lee, Electronics and Telecommunications Research Institute (South Korea)
Sang-Soo Choi, Electronics and Telecommunications Research Institute (South Korea)
Hai Bin Chung, Electronics and Telecommunications Research Institute (South Korea)
Hyung Joun Yoo, Electronics and Telecommunications Research Institute (South Korea)
Bo Woo Kim, Electronics and Telecommunications Research Institute (South Korea)


Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

© SPIE. Terms of Use
Back to Top