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Proceedings Paper

New method for optical proximity correction with gray-level serifs
Author(s): Jinglei Du; Qizhong Huang; Yongkang Guo; Zheng Cui
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Paper Abstract

Based on analysis of physical mechanics on optical proximity effect, we present a new method for fine correction of optical proximity effect and point out that the optimum of amplitude distribution on mask can improve distribution of spatial frequency spectrum, so intensity distribution of printed image near ideal distribution can be obtained. The simulation results show that deviation between contour of image after OPC and contour of ideal image is less than 0.009.

Paper Details

Date Published: 29 June 1998
PDF: 7 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310722
Show Author Affiliations
Jinglei Du, Sichuan Univ. (China)
Qizhong Huang, Sichuan Univ. (China)
Yongkang Guo, Sichuan Univ. (China)
Zheng Cui, Rutherford Appleton Lab. (United Kingdom)


Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

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