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Proceedings Paper

Benchmarking of software tools for optical proximity correction
Author(s): Angelika Jungmann; Joerg Thiele; Christoph M. Friedrich; Rainer Pforr; Wilhelm Maurer
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Paper Abstract

The point when optical proximity correction (OPC) will become a routine procedure for every design is not far away. For such a daily use the requirements for an OPC tool go far beyond the principal functionality of OPC that was proven by a number of approaches and is documented well in literature. In this paper we first discuss the requirements for a productive OPC tool. Against these requirements a benchmarking was performed with three different OPC tools available on market (OPRX from TVT, OPTISSIMO from aiss and PROTEUS from TMA). Each of these tools uses a different approach to perform the correction (rules, simulation or model). To assess the accuracy of the correction, a test chip was fabricated, which contains corrections done by each software tool. The advantages and weakness of the several solutions are discussed.

Paper Details

Date Published: 29 June 1998
PDF: 11 pages
Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310721
Show Author Affiliations
Angelika Jungmann, Siemens AG (Germany)
Joerg Thiele, Siemens AG (Germany)
Christoph M. Friedrich, Siemens AG (Germany)
Rainer Pforr, SIMEC GmbH (Germany)
Wilhelm Maurer, Siemens AG (United States)

Published in SPIE Proceedings Vol. 3334:
Optical Microlithography XI
Luc Van den Hove, Editor(s)

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