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Proceedings Paper

Fabrication of phase gratings in glass by ion implantation
Author(s): Istvan Banyasz; Miklos Fried; Csaba Duecso; Zofia Vertesy; Csaba Hajdu
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Paper Abstract

Transmission phase gratings of grating constants of 4, 6, 8 and 12 micrometers have been designed and fabricated in glass samples via implantation of helium and nitrogen ions of energies in the 500 keV - 1.6 MeV range, through photoresist masks of thickness of 3.3 micrometers . Both mono- and multienergy implantations have been applied. The gratings have been studied by measuring the diffraction efficiencies. The phase profiles of the lines of the gratings have also been measured directly via interference and phase contrast microscopy and scanning electron microscopy. It was found that the profile of the implanted gratings differed significantly from the quasi rectangular profile of the mask, especially in case of the two finest gratings. The highest first order diffraction efficiencies were around 20%. The dependence of the efficiencies of the gratings on the energy and dose of the implantation have been measured.

Paper Details

Date Published: 18 June 1998
PDF: 12 pages
Proc. SPIE 3291, Diffractive and Holographic Device Technologies and Applications V, (18 June 1998); doi: 10.1117/12.310575
Show Author Affiliations
Istvan Banyasz, Research Institute of Materials Science (Hungary)
Miklos Fried, Research Institute of Materials Science (Hungary)
Csaba Duecso, Research Institute of Materials Science (Hungary)
Zofia Vertesy, Research Institute of Materials Science (Hungary)
Csaba Hajdu, Research Institute of Particle and Nuclear Physics (Hungary)


Published in SPIE Proceedings Vol. 3291:
Diffractive and Holographic Device Technologies and Applications V
Ivan Cindrich; Sing H. Lee, Editor(s)

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