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Proceedings Paper

Comparative study of resist heating and proximity effect influence on CD variation in 30-kV EBL
Author(s): Sergey V. Babin; Peter Hudek; Ivan Kostic; Igor Yu. Kuzmin
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Paper Abstract

A method was developed to separate and quantitatively characterize a contribution of resist heating and proximity effects into CD-variation in electron-beam lithography. An experimental and theoretical study of these two effects were done using a 30 kV variably shaped beam system. TEMPTATION software tool was used to simulate temperature rise during electron exposures. Good agreement of experimental results and simulated data was found. A method was developed to measure proximity function which is free of resist heating influence.

Paper Details

Date Published: 5 June 1998
PDF: 7 pages
Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309629
Show Author Affiliations
Sergey V. Babin, Set-Service (United States)
Peter Hudek, Institute of Computer Systems (Germany)
Ivan Kostic, Institute of Computer Systems (Slovak Republic)
Igor Yu. Kuzmin, Set-Service (Russia)

Published in SPIE Proceedings Vol. 3331:
Emerging Lithographic Technologies II
Yuli Vladimirsky, Editor(s)

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