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Proceedings Paper

Mechanical distortions in advanced optical reticles
Author(s): Andrew R. Mikkelson; Michael A. Sprague; Roxann L. Engelstad; Edward G. Lovell; David Trost
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Paper Abstract

Finite element (FE) models have been created to investigate mechanical distortions associated with mask blank fabrication and mounting in a horizontal orientation. A modal analysis was completed to quantify the natural frequencies for the mask blank as a predictive tool for possible vibration prevention or control. By modeling the substrate with layers associated with the mask fabrication process and then by prestressing these layers, the resulting out-of-plane distortions (OPD) and in-plane distortions (IPD) can be determined. Utilizing these models, the magnitude of the maximum IPD and OPD due to gravity have been determined as a function of the mounting location to optimize the mounting position.

Paper Details

Date Published: 5 June 1998
PDF: 11 pages
Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309622
Show Author Affiliations
Andrew R. Mikkelson, Univ. of Wisconsin/Madison (United States)
Michael A. Sprague, Univ. of Colorado/Boulder (United States)
Roxann L. Engelstad, Univ. of Wisconsin/Madison (United States)
Edward G. Lovell, Univ. of Wisconsin/Madison (United States)
David Trost, Etec Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 3331:
Emerging Lithographic Technologies II
Yuli Vladimirsky, Editor(s)

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