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Proceedings Paper

Multilayer coating and tests of a 10x extreme-ultraviolet lithographic camera
Author(s): Eberhard Adolf Spiller; Frank J. Weber; Claude Montcalm; Sherry L. Baker; Eric M. Gullikson; James H. Underwood
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Paper Abstract

A new set of mirrors for the SANDIA 10X microstepper has been fabricated. The optics have been tested by optical profilometry, atomic force microscopy, EUV reflectometry and EUV scattering. THese measurements allow one to predict the performance of the camera. Mo/Si multilayer coatings with the required thickness profile were produced by DC magnetron sputtering using shadow masks in front of the rotating substrates. The figure errors of the new mirrors are considerably smaller than those obtained previously, while mid-spatial frequency roughness still needs improvement. This roughness reduces mostly the throughput of the system; i.e. most of the scattered light occurs outside the field of the camera and there is only a small reduction of contrast or resolution.

Paper Details

Date Published: 5 June 1998
PDF: 10 pages
Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309617
Show Author Affiliations
Eberhard Adolf Spiller, Lawrence Livermore National Lab. (United States)
Frank J. Weber, Lawrence Livermore National Lab. (United States)
Claude Montcalm, Lawrence Livermore National Lab. (United States)
Sherry L. Baker, Lawrence Livermore National Lab. (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
James H. Underwood, Lawrence Berkeley National Lab. (United States)

Published in SPIE Proceedings Vol. 3331:
Emerging Lithographic Technologies II
Yuli Vladimirsky, Editor(s)

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