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Proceedings Paper

X-ray exposures of electrodeposited photoresist for conformal lithography on corrugated surfaces
Author(s): Frank T. Hartley; Chantal G. Khan Malek; Steven Nguyen
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Paper Abstract

Proximity printing using synchrotron x-ray lithography provides high resolution pattern transfer with large depth of field, low diffraction effects and no reflection form the substrate. Electro-plating of photo-resist allows deposition of thin, uniform films over geometrically complex and topographically diverse, electrically conductive surfaces. Two electro-deposited photoresists produced by Shipley, EAGLE 2100 ED negative tone and PEPR 2400 positive tone resist, have been tested with x-rays demonstrating micron pattern transfer over depths-of-field in fractions of millimeters.

Paper Details

Date Published: 5 June 1998
PDF: 4 pages
Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309615
Show Author Affiliations
Frank T. Hartley, Jet Propulsion Lab. (United States)
Chantal G. Khan Malek, Louisiana State Univ. (France)
Steven Nguyen, Louisiana State Univ. (United States)


Published in SPIE Proceedings Vol. 3331:
Emerging Lithographic Technologies II
Yuli Vladimirsky, Editor(s)

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