Share Email Print

Proceedings Paper

Scattering and coherence in EUVL
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We illustrate the importance of considering scattering from the illuminator in extreme UV lithography systems. Our results indicate that a significant amount of amplitude modulation noise is present in the aerial image if scatter is present in a Koehler illuminator. The effect depends on the spatial frequency of the pattern on the mask, the numerical aperture of the projection camera, the coherence factor, and placement of the plane in the illuminator where the scattering occurs.

Paper Details

Date Published: 5 June 1998
PDF: 7 pages
Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309613
Show Author Affiliations
Tomas D. Milster, Optical Sciences Ctr./Univ. of Arizona (United States)
Neil A. Beaudry, Optical Sciences Ctr./Univ. of Arizona (United States)

Published in SPIE Proceedings Vol. 3331:
Emerging Lithographic Technologies II
Yuli Vladimirsky, Editor(s)

© SPIE. Terms of Use
Back to Top