Share Email Print
cover

Proceedings Paper

Novel x-ray mask structure with low out-of-plane distortion
Author(s): Young Jin Jeon; Sang-Soo Choi; Il Yong Kim; Hai Bin Chung; Bo Woo Kim
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

During the process of an x-ray mask, anodic bonding makes the wafer to be distorted largely because of the difference between thermal coefficient of a wafer and Pyrex. A novel structure which has an additional wafer on the lower surface of Pyrex was suggested to reduce x-ray mask OPD and the case calculations have been made in this paper. For the structure used in this study, the x-ray mask OPD of the suggested structure was 4.456 micrometers . The effect of the additional wafer inner radius on the x-ray mask OPD was also presented.

Paper Details

Date Published: 5 June 1998
PDF: 7 pages
Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309607
Show Author Affiliations
Young Jin Jeon, Electronics and Telecommunications Research Institute (South Korea)
Sang-Soo Choi, Electronics and Telecommunications Research Institute (South Korea)
Il Yong Kim, Korea Advanced Institute of Science and Technology (South Korea)
Hai Bin Chung, Electronics and Telecommunications Research Institute (South Korea)
Bo Woo Kim, Electronics and Telecommunications Research Institute (South Korea)


Published in SPIE Proceedings Vol. 3331:
Emerging Lithographic Technologies II
Yuli Vladimirsky, Editor(s)

© SPIE. Terms of Use
Back to Top