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Proceedings Paper

Electron-beam lithography on multilayer substrates: experimental and theoretical study
Author(s): Ioannis Raptis; Giancarlo Meneghini; Anja Rosenbusch; Nikos Glezos; Rafaelle Palumbo; Marco Ardito; Leonardo Scopa; George P. Patsis; Evangelos Valamontes; Panagiotis Argitis
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Paper Abstract

A fast simulator for electron beam lithography called SELID, is presented. For the exposure part, an analytical solution based on the Boltzmann transport equation is used instead of Monte Carlo. This method has been proved much faster than Monte Carlo. All important phenomena are included in the calculation. Additionally, the reaction/diffusion effects occurring during post exposure bake in the case of chemically amplified resists are taken into account. The result obtained by the simulation are compared successfully with experimental and other simulation results for conventional and chemically amplified resists. The case of substrates consisting of more than one layer is considered in depth as being of great importance in electron beam patterning. By using SELID, it is possible to forecast the resist profile with considerable accuracy for a wide range of resists, substrates and energies. Additionally, proximity effect parameters are extracted easily for use in any proximity correction package.

Paper Details

Date Published: 5 June 1998
PDF: 11 pages
Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309597
Show Author Affiliations
Ioannis Raptis, Institute of Microelectronics/NCSR Demokritos (Greece)
Giancarlo Meneghini, Ctr. Studi e Lab. Telecomunicazioni SpA (Italy)
Anja Rosenbusch, Sigma-C GmbH (United States)
Nikos Glezos, Institute of Microelectronics/NCSR Demokritos (Greece)
Rafaelle Palumbo, Ctr. Studi e Lab. Telecomunicazioni SpA (Italy)
Marco Ardito, Ctr. Studi e Lab. Telecomunicazioni SpA (Italy)
Leonardo Scopa, Istituto di Elettronica dello Stato Solido (Italy)
George P. Patsis, Institute of Microelectronics/NCSR Demokritos (Greece)
Evangelos Valamontes, Institute of Microelectronics/NCSR Demokritos (Greece)
Panagiotis Argitis, Institute of Microelectronics/NCSR Demokritos (Greece)


Published in SPIE Proceedings Vol. 3331:
Emerging Lithographic Technologies II
Yuli Vladimirsky, Editor(s)

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