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Proceedings Paper

Critical dimension and write time performance: a next-generation vector electron-beam mask patterning system
Author(s): Carl M. Rose; Lawrence C. Wang; Manny Ferreira
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Paper Abstract

This paper will provide a comprehensive review of the critical dimension performance of the V2000 in the areas of CD uniformity, CD linearity, CD precision, CD butting, CD X- Y bias, and line edge roughness. In addition a thorough comparison will be made of the writing times achieved for a wide range of masking levels on both advanced microprocessor and memory devices, as well as technically challenging test plates. These write times will be compared to those achieved by commercially available raster scan e-beam tools and laser beam systems.

Paper Details

Date Published: 5 June 1998
PDF: 11 pages
Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309584
Show Author Affiliations
Carl M. Rose, UltraBeam Lithography, Inc. (United States)
Lawrence C. Wang, Ultrabeam Lithography Inc. (United States)
Manny Ferreira, UltraBeam Lithography, Inc. (United States)

Published in SPIE Proceedings Vol. 3331:
Emerging Lithographic Technologies II
Yuli Vladimirsky, Editor(s)

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