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Proceedings Paper

Lithography on flexible substrates: a roll-to-roll high-throughput high-resolution system for low-cost production of microelectronics
Author(s): Kanti Jain; Thomas J. Dunn; Nestor Farmiga; Mark Zemel; Carl Weisbecker; Teik-Meng Lee
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Paper Abstract

We describe a novel lithography system that is capable of high-throughput projection imaging on continuous, flexible substrates in a roll-to-roll configuration. The system provides both large-area, high-resolution patterning in photoresists and via formation by photo-ablation in dielectrics, eliminating limitations of lithography tools currently used in the production of flexible circuits. The unique, modular design of the new system also provides equipment upgradability as well as choice of user-specified system configurations. These results are achieved with the combination of three key novel system features: a hexagonal seamless scanning projection imaging technology, a single- planar stage system configuration, and a roll-to-roll substrate handling system. These features provide high optical and scanning efficiencies as well as low overhead times, enabling processing throughputs as high as 4 sq. ft./min. In this paper, we describe the new lithography system concept; present the detailed system design of a recently completed machine; and discuss the key hardware subsystems, both optical and mechanical. This lithography system is highly attractive for cost-effective production of a wide variety of microelectronic products on flexible substrates, including printed circuits, multichip modules, and displays.

Paper Details

Date Published: 5 June 1998
PDF: 7 pages
Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309574
Show Author Affiliations
Kanti Jain, Anvik Corp. (United States)
Thomas J. Dunn, Anvik Corp. (United States)
Nestor Farmiga, Anvik Corp. (United States)
Mark Zemel, Anvik Corp. (United States)
Carl Weisbecker, Anvik Corp. (United States)
Teik-Meng Lee, Anvik Corp. (United States)


Published in SPIE Proceedings Vol. 3331:
Emerging Lithographic Technologies II
Yuli Vladimirsky, Editor(s)

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