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Proceedings Paper

Recent advances in the Sandia EUV 10x microstepper
Author(s): John E. M. Goldsmith; Pamela K. Barr; Kurt W. Berger; Luis J. Bernardez; Gregory Frank Cardinale; Joel R. Darnold; Daniel R. Folk; Steven J. Haney; Craig C. Henderson; Karen J. Jefferson; Kevin D. Krenz; Glenn D. Kubiak; Rodney P. Nissen; Donna J. O'Connell; Yon E. Perras; Avijit K. Ray-Chaudhuri; Tony G. Smith; Richard H. Stulen; Daniel A. Tichenor; Alfred A. Ver Berkmoes; John B. Wronosky
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Paper Abstract

The Sandia EUV 10x microstepper system is the result of an evolutionary development process, starting with a simple 20x system, progressing through an earlier 10x system, to the current system that has full microstepper capabilities. The 10x microstepper prints 400-micrometers -diameter fields at sub- 0.10-micrometers resolution. Upgrades include the replacement of the copper wire target with a pulsed xenon jet target, construction of an improved projection optics system, the addition of a dose monitor a d an aerial image monitor, and the addition of a graphical user interface to the system operation software. This paper provides an up-to-date report on the status of the microstepper.

Paper Details

Date Published: 5 June 1998
PDF: 9 pages
Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309570
Show Author Affiliations
John E. M. Goldsmith, Sandia National Labs. (United States)
Pamela K. Barr, Sandia National Labs. (United States)
Kurt W. Berger, Sandia National Labs. (United States)
Luis J. Bernardez, Sandia National Labs. (United States)
Gregory Frank Cardinale, Sandia National Labs. (United States)
Joel R. Darnold, Sandia National Labs. (United States)
Daniel R. Folk, Sandia National Labs. (United States)
Steven J. Haney, Sandia National Labs. (United States)
Craig C. Henderson, Sandia National Labs. (United States)
Karen J. Jefferson, Sandia National Labs. (United States)
Kevin D. Krenz, Sandia National Labs. (United States)
Glenn D. Kubiak, Sandia National Labs. (United States)
Rodney P. Nissen, Sandia National Labs. (United States)
Donna J. O'Connell, Sandia National Labs. (United States)
Yon E. Perras, Sandia National Labs. (United States)
Avijit K. Ray-Chaudhuri, Sandia National Labs. (United States)
Tony G. Smith, Sandia National Labs. (United States)
Richard H. Stulen, Sandia National Labs. (United States)
Daniel A. Tichenor, Sandia National Labs. (United States)
Alfred A. Ver Berkmoes, Sandia National Labs. (United States)
John B. Wronosky, Sandia National Labs. (United States)


Published in SPIE Proceedings Vol. 3331:
Emerging Lithographic Technologies II
Yuli Vladimirsky, Editor(s)

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