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Proceedings Paper

Modeling study of image formation with point sources
Author(s): Srinivas B. Bollepalli; Mumit Khan; Franco Cerrina
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Paper Abstract

It is well known that a point source produces a small magnification of the mask pattern on the wafer due to divergence; the effect becomes especially noticeable at the corners and edges of the field. In this article we model the image formation due to a point source and compare the deviations of the aerial images and developed patterns, from those at the center of the field. We illustrate the behavior with several computational results.

Paper Details

Date Published: 5 June 1998
PDF: 12 pages
Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309569
Show Author Affiliations
Srinivas B. Bollepalli, Univ. of Wisconsin/Madison (United States)
Mumit Khan, Univ. of Wisconsin/Madison (United States)
Franco Cerrina, Univ. of Wisconsin/Madison (United States)


Published in SPIE Proceedings Vol. 3331:
Emerging Lithographic Technologies II
Yuli Vladimirsky, Editor(s)

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