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Proceedings Paper

Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
Author(s): Patrick P. Naulleau; Kenneth A. Goldberg; Sang Hun Lee; Chang-Hasnain C. Chang; Cynthia J. Bresloff; Phillip J. Batson; David T. Attwood; Jeffrey Bokor
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Paper Abstract

The phase-shifting point diffraction interferometer (PS/PDI) has recently been developed and implement at Lawrence Berkeley National Laboratory to meet the significant measurement challenge of characterizing extreme UV (EUV) projection lithography systems. Here progress on the characterization of the PS/PDI accuracy is presented. Two major classes of errors affect the accuracy of the interferometer: the first being systematic effects arising from the measurement geometry, and the second being random and systematic errors caused by an imperfect reference wave. In order to characterize these contribution and calibrate the interferometer. Experimental results demonstrating a systematic-error-limited accuracy of 0.004 waves is reported.

Paper Details

Date Published: 5 June 1998
PDF: 10 pages
Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309563
Show Author Affiliations
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)
Sang Hun Lee, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Chang-Hasnain C. Chang, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Cynthia J. Bresloff, Lawrence Berkeley National Lab. (United States)
Phillip J. Batson, Lawrence Berkeley National Lab. (United States)
David T. Attwood, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Jeffrey Bokor, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 3331:
Emerging Lithographic Technologies II
Yuli Vladimirsky, Editor(s)

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