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Proceedings Paper

Minimizing mapping-induced OPD errors when testing aspheric mirrors
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Paper Abstract

Extreme UV (EUV) projection system are designed with mild spheres so that the mirrors can be tested at the center of curvature without null optics. The elimination of the null optics improves the fundamental accuracy of the test. However, this test configuration is not stigmatic, and the rays from the test wavefront and reference wavefront will not trace the same optical path through the viewing system. Effectively, the test and reference wavefront are sheared in the exit pupil of the viewing system. This shear leads to an OPD contribution from the viewing system that we label the mapping error. For visible light metrology, this induced OPD error can be a significant fraction of the EUV wavelength.

Paper Details

Date Published: 5 June 1998
PDF: 6 pages
Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309561
Show Author Affiliations
Russell M. Hudyma, Lawrence Livermore National Lab. (United States)
Gary E. Sommargren, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 3331:
Emerging Lithographic Technologies II
Yuli Vladimirsky, Editor(s)

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