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Proceedings Paper

X-ray measurement of tungsten films grown in a nonflowing laser-induced CVD process
Author(s): Elzbieta B. Jankowska-Kuchta; Carol McConica; Devin Moss; Janusz Kozlowski
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Paper Abstract

A lab scale nonflowing reactor was built to study chemical vapor deposition reactions and for the purpose of minimizing the waste of expensive high purity and toxic gases. The reactor operates as a batch process resulting in a time varying gas composition during the course of deposition. Samples were heated either resistively (thermal CVD) or with focused laser light (laser CVD). X-ray measurements were made on the deposited tungsten samples. Obtained results (tungsten structural parameters) were compared with the same parameters obtained for the tungsten films deposited in a commercial, flowing CVD process.

Paper Details

Date Published: 3 June 1998
PDF: 10 pages
Proc. SPIE 3274, Laser Applications in Microelectronic and Optoelectronic Manufacturing III, (3 June 1998); doi: 10.1117/12.309525
Show Author Affiliations
Elzbieta B. Jankowska-Kuchta, Technical Univ. of Wroclaw (Poland)
Carol McConica, Colorado State Univ. (United States)
Devin Moss, Colorado State Univ. (United States)
Janusz Kozlowski, Technical Univ. of Wroclaw (Italy)


Published in SPIE Proceedings Vol. 3274:
Laser Applications in Microelectronic and Optoelectronic Manufacturing III
Jan J. Dubowski; Peter E. Dyer, Editor(s)

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